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Nanometrisis participated  SPIE 2019 (Advanced Lithography) conference (February 24 – February 28, San Jose, California, USA) with 2 posters and an 2 oral presentations

Titles

Poster presentations:

  • Edge placement error and line edge roughness
  • Denoising line edge roughness measurement using hidden Markov models

Oral Presentation:

  • Deep learning nanometrology of line edge roughness
  • Defects in nano-imprint lithographics line patterns: computational modelling and measurement accuracy

(https://spie.org/conferences-and-exhibitions/advanced-lithography)

Nanometrisis @ SPIE 2019