Nanometrisis participated SPIE 2019 (Advanced Lithography) conference (February 24 – February 28, San Jose, California, USA) with 2 posters and an 2 oral presentations
Titles
Poster presentations:
- Edge placement error and line edge roughness
- Denoising line edge roughness measurement using hidden Markov models
Oral Presentation:
- Deep learning nanometrology of line edge roughness
- Defects in nano-imprint lithographics line patterns: computational modelling and measurement accuracy
(https://spie.org/conferences-and-exhibitions/advanced-lithography)
Nanometrisis @ SPIE 2019