Nanometrisis participated  SPIE 2019 (Advanced Lithography) conference (February 24 – February 28, San Jose, California, USA) with 2 posters and an 2 oral presentations


Poster presentations:

  • Edge placement error and line edge roughness
  • Denoising line edge roughness measurement using hidden Markov models

Oral Presentation:

  • Deep learning nanometrology of line edge roughness
  • Defects in nano-imprint lithographics line patterns: computational modelling and measurement accuracy


Nanometrisis @ SPIE 2019