We are proud to announce that our software NanoTOPO-SEM (Product link), has been used in the recent publication Chemical vapor deposition of Cu films from copper(I) cyclopentadienyl triethylphophine: Precursor characteristics and interplay between growth parameters and films morphology on Thin Solid Films journal.
Prud’homme N., Constantoudis V., Turgambaeva A.E., Krisyuk V.V., Samélor D., Senocq F., Vahlas C., Chemical vapor deposition of Cu films from copper(I) cyclopentadienyl triethylphophine: Precursor characteristics and interplay between growth parameters and films morphology. Thin Solid Films 701, 137967 (2020). DOI: 10.1016/j.tsf.2020.137967
Nanometrisis Software used in recent publication on Thin Solid Films journal