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Computational nanometrology of line-edge roughness: noise effects, cross-line correlations and the role of etch transfer

You are here: Nanometrisis > Publications > Computational nanometrology of line-edge roughness: noise effects, cross-line correlations and the role of etch transfer

“Computational nanometrology of line-edge roughness: noise effects, cross-line correlations and the role of etch transfer”,
March 2018,
DOI: 10.1117/12.2306282,
Conference: Advanced Etch Technology for Nanopatterning VII

Computational nanometrology of line-edge roughness: noise effects, cross-line correlations and the role of etch transfer
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