Challenges in line edge roughness metrology in directed self-Assembly lithography: Placement errors and cross-line correlations – Nanometrisis

“Challenges in line edge roughness metrology in directed self-Assembly lithography: Placement errors and cross-line correlations”
April 2017,
Journal of Micro/ Nanolithography, MEMS, and MOEMS 16(2):024001,
DOI: 10.1117/1.JMM.16.2.024001

Challenges in line edge roughness metrology in directed self-Assembly lithography: Placement errors and cross-line correlations

nanometrisis April 1, 2017November 1, 2019 Publications

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