“Challenges in line edge roughness metrology in directed self-Assembly lithography: Placement errors and cross-line correlations”
April 2017,
Journal of Micro/ Nanolithography, MEMS, and MOEMS 16(2):024001,
DOI: 10.1117/1.JMM.16.2.024001
Challenges in line edge roughness metrology in directed self-Assembly lithography: Placement errors and cross-line correlations