“Allowable SEM noise for unbiased LER measurement”, March 2018, DOI: 10.1117/12.2306509, Conference: Metrology, Inspection, and Process Control for Microlithography XXXII
Computational nanometrology of line-edge roughness: noise effects, cross-line correlations and the role of etch transfer
“Computational nanometrology of line-edge roughness: noise effects, cross-line correlations and the role of etch transfer”, March 2018, DOI: 10.1117/12.2306282, Conference: Advanced Etch Technology for Nanopatterning VII
Line edge roughness measurement through SEM images: effects of image digitization and their mitigation
“Line edge roughness measurement through SEM images: effects of image digitization and their mitigation” September 2017, DOI: 10.1117/12.2294060, Conference: 33rd European Mask and Lithography Conference
Challenges in line edge roughness metrology in directed self-Assembly lithography: Placement errors and cross-line correlations
“Challenges in line edge roughness metrology in directed self-Assembly lithography: Placement errors and cross-line correlations” April 2017, Journal of Micro/ Nanolithography, MEMS, and MOEMS 16(2):024001, DOI: 10.1117/1.JMM.16.2.024001
Computational nanometrology of nanostructures: the challenge of spatial complexity
“Computational nanometrology of nanostructures: the challenge of spatial complexity”, January 2017, DOI: 10.1051/metrology/201713001, Conference: 18th International Congress of Metrology
Advances on statistical physics of complex systems
“Advances on statistical physics of complex systems”, June 2016, International Journal of Modern Physics B 30(15), DOI: 10.1142/S0217979215020038