Challenges in line edge roughness metrology in directed self-Assembly lithography: Placement errors and cross-line correlations


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“Challenges in line edge roughness metrology in directed self-Assembly lithography: Placement errors and cross-line correlations” April 2017, Journal of Micro/ Nanolithography, MEMS, and MOEMS 16(2):024001, DOI: 10.1117/1.JMM.16.2.024001

Computational nanometrology of nanostructures: the challenge of spatial complexity


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“Computational nanometrology of nanostructures: the challenge of spatial complexity”, January 2017, DOI: 10.1051/metrology/201713001, Conference: 18th International Congress of Metrology

Advances on statistical physics of complex systems


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“Advances on statistical physics of complex systems”, June 2016, International Journal of Modern Physics B 30(15), DOI: 10.1142/S0217979215020038