Our company participated in the MNE conference. G. Papavieros presented orally his work with the title Mathematical and computational metrology of multiscale and hierarchical surfaces. The abstract of this work: Multiscale hierarchical surface structures have attracted great interest during the…
Hybridizing AI and domain knowledge in nanotechnology
Our team over the years has collaborated with the Institute of Informatics & Telecommunications. One of our missions is to solve open problems in nanometrology through Machine Learning based methods. This year, along with Dr. George Giannakopoulos for one of…
Nanometrisis Software used in recent publication on Thin Solid Films journal
We are proud to announce that our software NanoTOPO-SEM (Product link), has been used in the recent publication Chemical vapor deposition of Cu films from copper(I) cyclopentadienyl triethylphophine: Precursor characteristics and interplay between growth parameters and films morphology on Thin…
Paper publications in Micro and Nano Engineering (MNE)
Our company participated in Micro and Nano Engineering with two papers: Vekinis A.A., Constantoudis V., Neural network evaluation of geometric tip-sample effects in AFM measurements. Micro and Nano Engineering 8, art. no. 100057 (2020). DOI: 10.1016/j.mne.2020.100057 Vekinis A.A., Constantoudis V.,…
Deep learning denoising of SEM images towards noise-reduced LER measurements
“Deep learning denoising of SEM images towards noise-reduced LER measurements”, June 2019, Microelectronic Engineering 216:111051, DOI: 10.1016/j.mee.2019.111051
Defects in nano-imprint lithography line patterns: computational modelling and measurement accuracy
“Defects in nano-imprint lithography line patterns: computational modelling and measurement accuracy”, March 2019, DOI: 10.1117/12.2523931, Conference: Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2019
Deep learning nanometrology of line edge roughness
“Deep learning nanometrology of line edge roughness”, March 2019, DOI: 10.1117/12.2520941, Conference: Metrology, Inspection, and Process Control for Microlithography XXXIII
Edge placement error and line edge roughness
“Edge placement error and line edge roughness”, March 2019, DOI: 10.1117/12.2523419, Conference: Metrology, Inspection, and Process Control for Microlithography XXXIII
Denoising line edge roughness measurement using hidden Markov models
“Denoising line edge roughness measurement using hidden Markov models”, March 2019, DOI: 10.1117/12.2523422, Conference: Metrology, Inspection, and Process Control for Microlithography XXXIII
Line edge roughness metrology: Recent challenges and advances toward more complete and accurate measurements
“Line edge roughness metrology: Recent challenges and advances toward more complete and accurate measurements”, October 2018, Journal of Micro/ Nanolithography, MEMS, and MOEMS 17(4), DOI: 10.1117/1.JMM.17.4.041014