Publications

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“Deep learning denoising of SEM images towards noise-reduced LER measurements”, June 2019, Microelectronic Engineering 216:111051, DOI: 10.1016/j.mee.2019.111051

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“Defects in nano-imprint lithography line patterns: computational modelling and measurement accuracy”, March 2019, DOI: 10.1117/12.2523931, Conference: Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2019

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“Deep learning nanometrology of line edge roughness”, March 2019, DOI: 10.1117/12.2520941, Conference: Metrology, Inspection, and Process Control for Microlithography XXXIII

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“Edge placement error and line edge roughness”, March 2019, DOI: 10.1117/12.2523419, Conference: Metrology, Inspection, and Process Control for Microlithography XXXIII

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“Denoising line edge roughness measurement using hidden Markov models”, March 2019, DOI: 10.1117/12.2523422, Conference: Metrology, Inspection, and Process Control for Microlithography XXXIII

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“Line edge roughness metrology: Recent challenges and advances toward more complete and accurate measurements”, October 2018, Journal of Micro/ Nanolithography, MEMS, and MOEMS 17(4), DOI: 10.1117/1.JMM.17.4.041014

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“Multifractal analysis of line-edge roughness”, March 2018, DOI: 10.1117/12.2306508, Conference: Metrology, Inspection, and Process Control for Microlithography XXXII

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“Allowable SEM noise for unbiased LER measurement”, March 2018, DOI: 10.1117/12.2306509, Conference: Metrology, Inspection, and Process Control for Microlithography XXXII

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“Computational nanometrology of line-edge roughness: noise effects, cross-line correlations and the role of etch transfer”, March 2018, DOI: 10.1117/12.2306282, Conference: Advanced Etch Technology for Nanopatterning VII

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“Line edge roughness measurement through SEM images: effects of image digitization and their mitigation” September 2017, DOI: 10.1117/12.2294060, Conference: 33rd European Mask and Lithography Conference