Nanometrisis at SPIE 2026 in San Jose California

Nanometrisis at SPIE 2026 in San Jose California

Bytoni

This year Nanometrisis joined SPIE Advanced Lithography + Patterning 2026 with four posters. Our colleagues Alex Kondi and Antonis Stellas presented them on the third day of the conference. SPIE this year had four days in total full of interesting talks in a big variety of topics including: (more on the application tracks: https://spie.org/conferences-and-exhibitions/advanced-lithography-and-patterning/program/conferences/application-tracks) The plenary speakers were Unoh Kwon…

SummitRESIN Green 6th Month Meeting
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SummitRESIN Green 6th Month Meeting

Bytoni

Nanometrisis proudly participated in the 6th Month Meeting of the Resin Green Project last August, held at the Physikalisch-Technische Bundesanstalt (PTB) in Germany. The meeting focused on reviewing the project’s progress and advancing the discussions around its various Work Packages. It was an inspiring and productive gathering, bringing together key partners to share insights and…

Nanometrisis Software used in recent publication on Thin Solid Films journal

Bytoni

We are proud to announce that our software NanoTOPO-SEM (Product link), has been used in the recent publication Chemical vapor deposition of Cu films from copper(I) cyclopentadienyl triethylphophine: Precursor characteristics and interplay between growth parameters and films morphology on Thin Solid Films journal. Prud’homme N., Constantoudis V., Turgambaeva A.E., Krisyuk V.V., Samélor D., Senocq F., Vahlas C.,…

Nanometrisis joins IPCEI ME/CT

Bytoni

Nanometrisis is proud to announce its new role as an associate partner within the Important Projects of Common European Interest (IPCEI). PCEI ME/CT is a collaborative initiative aimed at driving innovation, research, and industrial deployment across the microelectronics and communication technologies value chain. Led by fourteen Member States of the European Union, this project represents…