Author: nanometrisis

Nanometrisis participated  SPIE 2019 (Advanced Lithography) conference (February 24 – February 28, San Jose, California, USA) with 2 posters and an 2 oral presentations Titles Poster presentations: Edge placement error and line edge roughness Denoising line edge roughness measurement using…

Σας περιμένουμε την Δευτέρα 12/11 15:00-16:00, στο Ζάππειο μέγαρο, να μάθουμε και να ακούσουμε για την Νανοτεχνολογία και την σχέση της με την επιχειρηματικότητα στην σύγχρονη κοινωνία, μέσα από την ειδική θεματική ενότητα ομιλιών, στο 2ρο Athens Innovation Festival: https://www.athensinnovation.gr/programma/…

Nanometrisis received the 2nd New Entrepreneurship Award at the Athens Start-up Awards, organized for a second consecutive year, by the Athens Chamber of Commerce and Industry (ACCI) and the Attica Region Governance on Wednesday, July 11 2018, at Zappeion Megaron.…

Nanometrisis participated with a booth at “The Next Web 2018” (TNW 2018) conference in Amsterdam, 24-25 May 2018     https://thenextweb.com/  

Nanometrisis attended the 7th National Conference on Metrology (11/12-May-2018, Athens) with an invited talk and one oral presentation Titles : – Nanotechnology challenges and prospects (invited) – Commputational Nanometrology of Line Edge Roughness in Semiconductor Manufacturing (oral presentation) (http://metrologia2018.ece.ntua.gr/)

Nanometrisis team was at SPIE2018 (https://spie.org/AL/conferencedetails/metrology-inspection-process-control-microlithography) with the following papers: 1) Computational Nanometrology of Line Edge Roughness: Noise effects and the role of etch transfer (poster) ABSTRACT The aim of this paper is to investigate the role of etch transfer…

Nanometrisis  participated in the 13th Paints Symposium (Athens, March 15/16, 2018) with an Oral presentation Title: Quantitative Characterization of Surface Roughness: Standard Approaches and New Challenges (https://www.greekpaints.com/en/symposium-2018/)