Nano-business Workshop @ 2nd Athens Innovation Festival


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Σας περιμένουμε την Δευτέρα 12/11 15:00-16:00, στο Ζάππειο μέγαρο, να μάθουμε και να ακούσουμε για την Νανοτεχνολογία και την σχέση της με την επιχειρηματικότητα στην σύγχρονη κοινωνία, μέσα από την ειδική θεματική ενότητα ομιλιών, στο 2ρο Athens Innovation Festival: https://www.athensinnovation.gr/programma/…

Line edge roughness metrology: Recent challenges and advances toward more complete and accurate measurements


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“Line edge roughness metrology: Recent challenges and advances toward more complete and accurate measurements”, October 2018, Journal of Micro/ Nanolithography, MEMS, and MOEMS 17(4), DOI: 10.1117/1.JMM.17.4.041014

2nd place at Athens Startup Awards 2018


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Nanometrisis received the 2nd New Entrepreneurship Award at the Athens Start-up Awards, organized for a second consecutive year, by the Athens Chamber of Commerce and Industry (ACCI) and the Attica Region Governance on Wednesday, July 11 2018, at Zappeion Megaron.…

Nanometrisis @ TNW 2018


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Nanometrisis participated with a booth at “The Next Web 2018” (TNW 2018) conference in Amsterdam, 24-25 May 2018     https://thenextweb.com/  

Nanometrisis @ National Conference on Metrology


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Nanometrisis attended the 7th National Conference on Metrology (11/12-May-2018, Athens) with an invited talk and one oral presentation Titles : – Nanotechnology challenges and prospects (invited) – Commputational Nanometrology of Line Edge Roughness in Semiconductor Manufacturing (oral presentation) (http://metrologia2018.ece.ntua.gr/)

Multifractal analysis of line-edge roughness


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“Multifractal analysis of line-edge roughness”, March 2018, DOI: 10.1117/12.2306508, Conference: Metrology, Inspection, and Process Control for Microlithography XXXII

Nanometrisis at SPIE 2018


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Nanometrisis team was at SPIE2018 (https://spie.org/AL/conferencedetails/metrology-inspection-process-control-microlithography) with the following papers: 1) Computational Nanometrology of Line Edge Roughness: Noise effects and the role of etch transfer (poster) ABSTRACT The aim of this paper is to investigate the role of etch transfer…

Nanometrisis @ 13th Paint Symposium


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Nanometrisis  participated in the 13th Paints Symposium (Athens, March 15/16, 2018) with an Oral presentation Title: Quantitative Characterization of Surface Roughness: Standard Approaches and New Challenges (https://www.greekpaints.com/en/symposium-2018/)

Allowable SEM noise for unbiased LER measurement


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“Allowable SEM noise for unbiased LER measurement”, March 2018, DOI: 10.1117/12.2306509, Conference: Metrology, Inspection, and Process Control for Microlithography XXXII

Computational nanometrology of line-edge roughness: noise effects, cross-line correlations and the role of etch transfer


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“Computational nanometrology of line-edge roughness: noise effects, cross-line correlations and the role of etch transfer”, March 2018, DOI: 10.1117/12.2306282, Conference: Advanced Etch Technology for Nanopatterning VII