Nanometrisis was awarded the “Startup Entrepreneurship award” at ACCI AWARDS 2020 that took place at “The Athens Concert Hall” on January 14 2020 links: https://www.acci.gr/acci/articles/article.jsp?context=103&categoryid=202&articleid=21842 https://www.kathimerini.gr/1060442/article/oikonomia/epixeirhseis/aponemh8hkan-se-dwdeka-epixeirhseis-ta-vraveia-evea-2020 https://www.capital.gr/epixeiriseis/3404737/poies-etaireies-brabeutikan-sta-brabeia-ebea-2020
Nanometrisis @ MNE 2019
Nanometrisis participated Micro & Nano Engineering 2019 conference (September 22 – September 27, Rodos, Greece) with 1 oral presentation, 1 poster and an exhibition booth. Titles: Improving the accuracy of Line Edge Roughness measurement using Hidden Markov Models(poster) Deep Learning…
Nanometrisis @ 84th Thessaloniki International Fair 2019
Nanometrisis participated at the 84th Thessaloniki International Fair TIF2019 (7-15 September 2019, Thessaloniki, Greece)
Nanometrisis @Nanotexnology 2019
Nanometrisis attended Nanotexnology 2019 NN19 (July 2-July 5, Thessaloniki, Greece) with 1 invited talk and 1 oral presentation. Titles: Denoising line edge roughness measurements using Hidden Markov Models (oral) Deep learning nanometrology: Denoising Scanning Electron Microscope images toward Line Edge…
Deep learning denoising of SEM images towards noise-reduced LER measurements
“Deep learning denoising of SEM images towards noise-reduced LER measurements”, June 2019, Microelectronic Engineering 216:111051, DOI: 10.1016/j.mee.2019.111051
Defects in nano-imprint lithography line patterns: computational modelling and measurement accuracy
“Defects in nano-imprint lithography line patterns: computational modelling and measurement accuracy”, March 2019, DOI: 10.1117/12.2523931, Conference: Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2019
Deep learning nanometrology of line edge roughness
“Deep learning nanometrology of line edge roughness”, March 2019, DOI: 10.1117/12.2520941, Conference: Metrology, Inspection, and Process Control for Microlithography XXXIII
Edge placement error and line edge roughness
“Edge placement error and line edge roughness”, March 2019, DOI: 10.1117/12.2523419, Conference: Metrology, Inspection, and Process Control for Microlithography XXXIII
Denoising line edge roughness measurement using hidden Markov models
“Denoising line edge roughness measurement using hidden Markov models”, March 2019, DOI: 10.1117/12.2523422, Conference: Metrology, Inspection, and Process Control for Microlithography XXXIII
Nanometrisis @ SPIE 2019
Nanometrisis participated SPIE 2019 (Advanced Lithography) conference (February 24 – February 28, San Jose, California, USA) with 2 posters and an 2 oral presentations Titles Poster presentations: Edge placement error and line edge roughness Denoising line edge roughness measurement using…