Position: Software Engineer We are looking for software engineers to work on image processing for diagnostic and health related applications. One such application is related to the project “LEGEND: Legionella spp. diagnosis in 2 hours: A lab-on-a-chip for rapid, colorimetric…
Startup Entrepreneurship award 2020
Nanometrisis was awarded the “Startup Entrepreneurship award” at ACCI AWARDS 2020 that took place at “The Athens Concert Hall” on January 14 2020 links: https://www.acci.gr/acci/articles/article.jsp?context=103&categoryid=202&articleid=21842 https://www.kathimerini.gr/1060442/article/oikonomia/epixeirhseis/aponemh8hkan-se-dwdeka-epixeirhseis-ta-vraveia-evea-2020 https://www.capital.gr/epixeiriseis/3404737/poies-etaireies-brabeutikan-sta-brabeia-ebea-2020
Nanometrisis @ MNE 2019
Nanometrisis participated Micro & Nano Engineering 2019 conference (September 22 – September 27, Rodos, Greece) with 1 oral presentation, 1 poster and an exhibition booth. Titles: Improving the accuracy of Line Edge Roughness measurement using Hidden Markov Models(poster) Deep Learning…
Nanometrisis @ 84th Thessaloniki International Fair 2019
Nanometrisis participated at the 84th Thessaloniki International Fair TIF2019 (7-15 September 2019, Thessaloniki, Greece)
Nanometrisis @Nanotexnology 2019
Nanometrisis attended Nanotexnology 2019 NN19 (July 2-July 5, Thessaloniki, Greece) with 1 invited talk and 1 oral presentation. Titles: Denoising line edge roughness measurements using Hidden Markov Models (oral) Deep learning nanometrology: Denoising Scanning Electron Microscope images toward Line Edge…
Deep learning denoising of SEM images towards noise-reduced LER measurements
“Deep learning denoising of SEM images towards noise-reduced LER measurements”, June 2019, Microelectronic Engineering 216:111051, DOI: 10.1016/j.mee.2019.111051
Defects in nano-imprint lithography line patterns: computational modelling and measurement accuracy
“Defects in nano-imprint lithography line patterns: computational modelling and measurement accuracy”, March 2019, DOI: 10.1117/12.2523931, Conference: Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2019
Deep learning nanometrology of line edge roughness
“Deep learning nanometrology of line edge roughness”, March 2019, DOI: 10.1117/12.2520941, Conference: Metrology, Inspection, and Process Control for Microlithography XXXIII
Edge placement error and line edge roughness
“Edge placement error and line edge roughness”, March 2019, DOI: 10.1117/12.2523419, Conference: Metrology, Inspection, and Process Control for Microlithography XXXIII
Denoising line edge roughness measurement using hidden Markov models
“Denoising line edge roughness measurement using hidden Markov models”, March 2019, DOI: 10.1117/12.2523422, Conference: Metrology, Inspection, and Process Control for Microlithography XXXIII