Nanometrisis at SPIE 2026 in San Jose California
This year Nanometrisis joined SPIE Advanced Lithography + Patterning 2026 with four posters.
Our colleagues Alex Kondi and Antonis Stellas presented them on the third day of the conference. SPIE this year had four days in total full of interesting talks in a big variety of topics including:
- Extreme ultraviolet (EUV) lithography
- Novel patterning technologies: semiconductors, MEMS, NEMS, MOEMS
- Metrology, inspection, and process control for microlithography
- Advances in patterning materials and processes; optical microlithography
- Design-process-technology co-optimization for manufacturability
- Advanced etch technology and process integration for nanopatterning
(more on the application tracks: https://spie.org/conferences-and-exhibitions/advanced-lithography-and-patterning/program/conferences/application-tracks)
The plenary speakers were Unoh Kwon from SK hynix and Hui Peng Koh from GlobalFoundries. Both talks, as well as the rest of the conference, showed that:
- There is still a lot of room for possible advancements in lithography systems, especially as we transition toward high-NA EUV and complex 3D structures.
- Metrology will play a key role in unlocking these advancements, particularly for high-bandwidth memory (HBM) and advanced memory chips where defect detection and process control are becoming more critical than ever.
The organization of the event was great, and Nanometrisis was proud to be part of it!
