Nanometrisis at SPIE 2018

Nanometrisis team was at SPIE2018 (https://spie.org/AL/conferencedetails/metrology-inspection-process-control-microlithography) with the following papers: 1) Computational Nanometrology of Line Edge Roughness: Noise effects and the role of etch transfer (poster) ABSTRACT The aim of this paper is to investigate the role of etch transfer…

Nanometrisis awarded Diana Nyyssonen Award for Best Paper at SPIE Metrology, Inspection, and Process Control

Our paper “Challenges in LER/CDU metrology of DSA structures: placement error and cross-line correlations” (http://spie.org/Publications/Proceedings/Paper/10.1117/12.2230849)  has been selected as the winner of the Diana Nyyssonen Award for Best Paper at SPIE Metrology, Inspection, and Process Control. The presentation of the award will…