Nanometrisis at SPIE 2018

Nanometrisis team was at SPIE2018 (https://spie.org/AL/conferencedetails/metrology-inspection-process-control-microlithography) with the following papers: 1) Computational Nanometrology of Line Edge Roughness: Noise effects and the role of etch transfer (poster) ABSTRACT The aim of this paper is to investigate the role of etch transfer…